Electrostatic multipole device, electrostatic multipole arrangement, and method of manufacturing an electrostatic multipole device
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
Sep 5, 2017
Issued Date -
N/A
app pub date -
Nov 20, 2015
filing date -
Nov 20, 2015
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
An electrostatic multipole device for influencing a charged particle beam propagating along an optical axis is described. The electrostatic multipole device comprises a substrate with at least one aperture opening for the charged particle beam, which extends along the optical axis through the substrate, and four or more electrodes which are formed on a first main surface of the substrate to influence the charged particle beam propagating through the aperture opening, wherein each of the four or more electrodes is arranged at a radial distance from a beam limiting edge of the aperture opening. Further, a method of manufacturing an electrostatic multipole device is described.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully