Substrate treatment apparatus, and method for controlling temperature of heater
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United States of America Patent
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Sep 12, 2017
Grant Date -
Oct 22, 2015
app pub date -
Dec 18, 2013
filing date -
Dec 18, 2012
priority date (Note) -
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Abstract
A substrate processing apparatus includes a main chamber having a process space in which a process with respect to a substrate is performed, a heater disposed in the process space to heat the substrate placed on an upper portion thereof, and a cooling ring around the heater, the cooling ring having a plurality of cooling gas passages spaced apart at a predetermined distance around the heater to allow a refrigerant supplied from the outside to selectively flow therein.
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