Pattern trimming compositions and methods

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United States of America Patent

PATENT NO 9760011
APP PUB NO 20170255102A1
SERIAL NO

15062701

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Abstract

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Photoresist pattern trimming compositions comprise: a polymer that is soluble in a 0.26 normality aqueous tetramethylammonium hydroxide solution; and a solvent system, wherein the solvent system comprises one or more monoether solvents in a combined amount of from 50 to 98 wt % based on the solvent system. The compositions find particular applicability in the manufacture of semiconductor devices.

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Patent Owner(s)

Patent OwnerAddress
DUPONT ELECTRONIC MATERIALS INTERNATIONAL LLC455 FOREST STREET MARLBOROUGH MA 01752

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kaur, Irvinder Northborough, US 35 118
Liu, Cong Shrewsbury, US 200 768
Park, Jong Keun Shrewsbury, US 65 724
Rowell, Kevin Brighton, US 12 228
Xu, Cheng Bai Southborough, US 4 26

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