Substrate structure

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United States of America Patent

PATENT NO 9761515
SERIAL NO

15475133

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A substrate structure includes a dielectric layer, a metal foil, a patterned metal layer, a first patterned solder-resist layer, a release layer and a second patterned solder-resist layer. The dielectric layer includes a first surface having a plurality of recesses and a second surface. The metal foil is disposed on the second surface. The patterned metal layer is disposed on the first surface, the patterned metal layer has a plurality of openings, and the openings are respectively corresponding to and expose the recesses. The first patterned solder-resist layer is filled in each of the recesses and corresponding to each of the openings. A top surface of the first patterned solder-resist layer is substantially coplanar with a top surface of the patterned metal layer. The second patterned solder-resist layer is disposed on the first patterned solder-resist layer and in the openings, and covers a portion of the patterned metal layer.

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Patent Owner(s)

Patent OwnerAddress
SUBTRON TECHNOLOGY CO LTDNO 8 GUANGFU N RD SCIENCE-BASED INDUSTRIAL PARK HUKOU TOWNSHIP HSINCHU COUNTY 303

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Wang, Chao-Min Hsinchu County, TW 12 14

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