Method and system for providing ultrapure water

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United States of America Patent

PATENT NO 9764968
SERIAL NO

13790629

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Abstract

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A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.

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Patent Owner(s)

Patent OwnerAddress
EVOQUA WATER TECHNOLOGIES LLC210 SIXTH AVENUE SUITE 3300 PITTSBURGH PA 15222

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Coulter, Bruce Lee Rockford, US 11 113

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