Chemical mechanical polishing (CMP) composition comprising a protein

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United States of America Patent

PATENT NO 9777192
APP PUB NO 20150017454A1
SERIAL NO

14377648

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Abstract

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Chemical mechanical polishing composition is provided. The composition comprises (A) inorganic particles, organic particles, or a mixture or composite thereof, (B) a protein, and (C) an aqueous medium.

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Patent Owner(s)

Patent OwnerAddress
BASF SECARL-BOSCH-STRASSE 38 LUDWIGSHAFEN AM RHEIN 67056

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lange, Roland Limburgerhof, DE 33 185
Lauter, Michael Mannheim, DE 35 113
Li, Yuzhuo - 62 602
Noller, Bastian Marten Lorsch, DE 16 79

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