Mask for photolithography, method of manufacturing the same and method of manufacturing substrate using the same

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United States of America Patent

PATENT NO 9778558
SERIAL NO

14752415

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Abstract

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A mask for photolithography includes: a transparent substrate; a phase shift pattern on the transparent substrate and configured to change a phase of light; a dielectric layer on the transparent substrate; and a negative refractive-index meta material layer on the dielectric layer.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG DISPLAY CO LTDYONGIN-SI GYEONGGI-DO 17113
INDUSTRY-ACADEMIC COOPERATION FOUNDATION YONSEI UNIVERSITY(YONSEI UNIVERSITY SINCHON-DONG) 50 YONSEI-RO SEODAEMUN-GU SEOUL 03722

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Baek, Seung-Hwa Incheon, KR 2 4
Ju, Jin-Ho Seoul, KR 73 231
Kang, Min Seoul, KR 82 236
Kim, Bong-Yeon Seoul, KR 28 79
Kim, Kyoung-Sik Seoul, KR 8 13
Kong, Hyang-Shik Seongnam-si, KR 96 796
Lee, Hyun-Joo Seoul, KR 27 76
Son, Yong Suwon-si, KR 15 96

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