Method of, and apparatus for, forming hard mask

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United States of America Patent

PATENT NO 9779958
SERIAL NO

14560659

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Abstract

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A method of forming a hard mask includes depositing step for depositing a titanium nitride film on a surface of a to-be-processed object; adsorbing step for adsorbing oxygen-containing molecules onto a surface of the titanium nitride film; and heating step for heating the titanium nitride film to a predetermined temperature.

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Patent Owner(s)

Patent OwnerAddress
ULVAC INCCHIGASAKI-SHI KANAGAWA 253-8543

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nakano, Katsuaki Chigasaki, JP 17 96

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