Electrostatic discharge protection structure and fabrication method thereof
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United States of America Patent
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Oct 3, 2017
Grant Date -
Jun 23, 2016
app pub date -
Feb 28, 2016
filing date -
Apr 28, 2012
priority date (Note) -
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Abstract
An electrostatic discharge protection structure includes: substrate of a first type of conductivity, well region of a second type of conductivity, substrate contact region in the substrate and of the first type of conductivity, well contact region in the well region and of the second type of conductivity, substrate counter-doped region between the substrate contact region and the well contact region and of the second type of conductivity, well counter-doped region between the substrate contact region and the well contact region and of the first type of conductivity, communication region at a lateral junction between the substrate and the well region, first isolation region between the substrate counter-doped region and the communication region, second isolation region between the well counter-doped region and the communication region, oxide layer having one end on the first isolation region and another end on the substrate, and field plate structure on the oxide layer.
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