Quantitative X-ray analysis—matrix thickness correction
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United States of America Patent
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Oct 10, 2017
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Mar 3, 2015
filing date -
Mar 3, 2015
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Abstract
Quantitative X-ray analysis is carried out by making X-ray fluorescence measurements to determine the elemental composition of a sample and a correction measurement by measuring the transmitted intensity of X-rays at an energy E transmitted directly through the sample without deviation. An X-ray diffraction measurement is made in transmission by directing X-rays from an X-ray source at the energy E onto a sample at an incident angle ψ1 to the surface of the sample and measuring a measured intensity Id(θfl) of the diffracted X-rays at the energy E with an X-ray detector at an exit angle ψ2 corresponding to an X-ray diffraction peak of a predetermined component. A matrix corrected X-ray intensity is obtained using the measured X-ray intensity in the X-ray diffraction measurement, the correction measurement and the mass attenuation coefficient of the sample calculated from the elemental composition and the mass attenuation coefficients of the elements.
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