Plasma processing apparatus and method for manufacturing electronic component

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United States of America Patent

PATENT NO 9786472
SERIAL NO

14873255

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A plasma processing apparatus performs plasma processing on a substrate held by a carrier. The carrier includes a frame disposed around the substrate and a holding sheet which holds the substrate and the frame. The plasma processing apparatus includes: a chamber; a stage which is disposed within the chamber and has an upper surface on which the carrier is mounted; a gas hole which is provided at a position of the upper surface opposing a bottom surface of the frame and through which cooling gas is supplied between the stage and the carrier; and a plasma exciting unit which generates plasma within the chamber.

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Patent Owner(s)

  • PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Iwai, Tetsuhiro Osaka, JP 33 657
Okita, Shogo Hyogo, JP 83 2349
Watanabe, Syouzou Osaka, JP 13 1147

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