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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY	141 GAJEONG-RO YUSEONG-GU DAEJEON 34114

International Classification(s)

• C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
• C07F:ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CO....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
An, Ki-Seok	Daejeon, KR	9	531
Chung, Taek-Mo	Daejeon, KR	9	531
George, Sheby Mary	Daejeon, KR	2	0
Jeon, Dong-Ju	Daejeon, KR	5	30
Jeong, Seog-Jong	Daejeon, KR	1	0
Kim, Chang-Gyoun	Daejeon, KR	8	525
Lee, Sun-Sook	Daejeon, KR	5	519
Lee, Young-Kuk	Daejeon, KR	3	513
Lim, Jong-Sun	Daejeon, KR	10	46
Park, Bo-Keum	Gangwon-do, KR	1	0

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Apr 17, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Apr 17, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
October 17, 2017	US,9790238,B2   US9790238B2	GRANTED PATENT AS SECOND PUBLICATION
June 25, 2015	US,20150175629,A1   US20150175629A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 9790238

Strontium precursor, method for preparing same, and method for forming thin film by using same

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