Method of integrating inorganic light emitting diode with oxide thin film transistor for display applications

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United States of America Patent

PATENT NO 9793252
SERIAL NO

15085128

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Abstract

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A method of fabricating an active matrix display is disclosed in which one or more oxide thin film transistors is monolithically integrated with an inorganic light emitting diode structure. The method comprises forming an array of inorganic light emitting diodes over a substrate defining a plurality of sub-pixels, depositing an insulating layer over the inorganic LED array, forming conductive vias through the insulating layer, one via for each LED in the LED array, and forming a metal oxide thin film transistor backplane, including an array of pixel driver circuits, over the dielectric layer and conductive vias, wherein one driver circuit electrically controls each sub-pixel through the dielectric layer.

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Patent Owner(s)

Patent OwnerAddress
EMAGIN CORPORATION700 SOUTH DRIVE SUITE 201 HOPEWELL JUNCTION NY 12533

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ghosh, Amalkumar P Hopewell Junction, US 70 1387

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