Apparatus and method for removing particles present on a wafer using photoelectrons and an electric field

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United States of America Patent

PATENT NO 9796001
SERIAL NO

14927292

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Abstract

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A wafer processing apparatus includes a particle charger for charging particles adsorbed onto a wafer with photoelectrons emitted from an emitter metal layer and a particle remover for applying an electric field to the wafer, which removes the charged particles from the wafer.

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Patent Owner(s)

  • SK HYNIX INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Si Hyun Cheongju, KR 2 7
Sim, Jae Hee Cheongju, KR 6 3

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