Cleaning liquid for lithography and method for cleaning substrate

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United States of America Patent

PATENT NO 9796953
SERIAL NO

14925034

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Abstract

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A cleaning liquid for lithography that is capable of removing residual material which remains after an etching process, as well as suppressing corrosion of at least one of cobalt and alloys thereof, and a method for cleaning a substrate using the cleaning liquid. The cleaning liquid for lithography includes hydroxylamine, at least one basic compound selected from amine compounds other than hydroxylamine, and quaternary ammonium hydroxides, and water, and has a pH value of 8 or higher. The cleaning liquid is used in cleaning a substrate containing at least one of cobalt and alloys thereof.

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Patent Owner(s)

Patent OwnerAddress
TOKYO OHKA KOGYO CO LTD150 NAKAMARUKO NAKAHARA-KU KAWASAKI-SHI KANAGAWA 20110012

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kumagai, Tomoya Kawasaki, JP 38 214
Sugawara, Mai Kawasaki, JP 19 55
Ueno, Naohisa Kawasaki, JP 10 37

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