Methods for fabricating a chemical-mechanical polishing composition

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United States of America Patent

PATENT NO 9803106
APP PUB NO 20150376460A1
SERIAL NO

14750050

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Abstract

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Methods for fabricating a chemical-mechanical polishing composition include growing colloidal silica abrasive particles in a liquid including an aminosilane compound such that the aminosilane compound becomes incorporated in the abrasive particles. A dispersion including such colloidal silica abrasive particles may be further processed to obtain a chemical-mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein.

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Patent Owner(s)

  • CABOT MICROELECTRONICS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cavanaugh, Mary Naperville, US 5 45
Clingerman, Daniel Chicago, US 3 4
Dysard, Jeffrey St. Charles, US 30 301
Grumbine, Steven Aurora, US 42 287
Shen, Ernest Naperville, US 4 31

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