CMP composition for silicon nitride removal

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United States of America Patent

PATENT NO 9803109
SERIAL NO

14612736

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Abstract

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The invention provides a chemical-mechanical polishing composition comprising: (a) colloidal silica particles that are surface modified with metal ions selected from Mg, Ca, Al, B, Be, and combinations thereof, and wherein the colloidal silica particles have a surface hydroxyl group density of from about 1.5 hydroxyls per nm2 to about 8 hydroxyls per nm2 of a surface area of the particles, (b) an anionic surfactant, (c) a buffering agent, and (d) water, wherein the polishing composition has a pH of about 2 to about 7, and wherein the polishing composition is substantially free of an oxidizing agent that oxidizes a metal. The invention further provides a method of chemically-mechanically polishing a substrate with the inventive chemical-mechanical polishing composition. Typically, the substrate contains silicon nitride, silicon oxide, and/or polysilicon.

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Patent Owner(s)

  • CABOT MICROELECTRONICS CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huang, Hung-Tsung Tainan, TW 7 18
Tsai, Chih-Pin Kaohsiung, TW 3 24
Yeh, Ming-Chih Taipei County, TW 4 25

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