Stage apparatus, lithography apparatus, and article manufacturing method
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United States of America Patent
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Oct 31, 2017
Grant Date -
Apr 16, 2015
app pub date -
Oct 15, 2014
filing date -
Oct 16, 2013
priority date (Note) -
In Force
status (Latency Note)
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Abstract
Provided is a stage apparatus that includes a first movable unit; a linear motor that includes a stator coil array arranged over a stroke range in a predetermined direction of the first movable unit and a mover magnet fixed to the first movable unit; a second movable unit that is arranged to face the first movable unit via a space and relatively moves with respect to the first movable unit in the predetermined direction; and a switch unit that forms a closed circuit including coils in the stator coil array and a resistance during operation of a dynamic brake, wherein the resistance value of a first coil located at a center region of the stroke range in the stator coil array is larger than that of a second coil located toward an end side of the stroke range rather than the center region in the stator coil array.
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Cited Art Landscape
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