Device for determining the temperature of a substrate

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United States of America Patent

PATENT NO 9805993
SERIAL NO

14384223

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Abstract

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An apparatus and a method for determining the temperature of a substrate, in particular of a semiconductor substrate during the heating thereof by means of at least one first radiation source are disclosed. A determination of the temperature is based on detecting first and second radiations, each comprising radiation emitted by the substrate due to its own temperature and radiation emitted by the first radiation, which is reflected at the substrate and at least one of a drive power of the first radiation source and the radiation intensity of the first radiation source.

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Patent Owner(s)

Patent OwnerAddress
HQ-DIELECTRICS GMBH89156 DORNSTADT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lerch, Wilfried Dornstadt, DE 20 161
Niess, Jürgen Sontheim, DE 2 2
Rick, Hartmut Dornstadt, DE 1 2

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