Atomic layer deposition apparatus

Number of patents in Portfolio can not be more than 2000

United States of America Patent

PATENT NO 9809880
SERIAL NO

14444231

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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An atomic layer deposition apparatus includes a first base plate on which a seat portion is defined to allow a substrate to be seated thereon, a second base plate disposed opposite to the first base plate, a first gas nozzle portion arranged on the second base plate, a second gas nozzle portion arranged on the second base plate to be spaced apart from the first gas nozzle portion and substantially parallel to the first gas nozzle portion, and a gas storage portion connected to the first gas nozzle portion and the second gas nozzle portion.

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Patent Owner(s)

  • SAMSUNG DISPLAY CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Huh, Myung Soo Suwon-si, KR 34 91
Jang, Choel Min Seoul, KR 7 4
Jung, Suk Won Seoul, KR 39 121
Kim, In Kyo Seongnam-si, KR 5 12

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