Cleaning device and cleaning process for a plasma reactor

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United States of America Patent

PATENT NO 9812298
SERIAL NO

14313200

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Abstract

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The invention concerns a device and a process, the device being a cleaning device utilizing a dry chemical means assisted by plasma from a reactor (10) containing an unwanted deposit on its walls and at least one other polarizable surface (12), characterized in that it comprises means (13, 14) for positively polarizing one or each of the polarizable surfaces relative to the reactor walls maintained at a reference potential.

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Patent Owner(s)

Patent OwnerAddress
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS)75016 PARIS

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bechu, Stephane Jean Louis Chantesse, FR 1 0
Bes, Alexandre Vourey, FR 4 10
Lacoste, Ana Saint Martin le Vinoux, FR 20 63
Pelletier, Jacques Henri Saint Martin d'Heres, FR 2 1
Sirou, Jerome Grenoble, FR 1 0

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