Seal ring structure with a metal pad

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United States of America Patent

PATENT NO 9812409
SERIAL NO

14715087

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ATTORNEY / AGENT: (SPONSORED)

Importance

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Abstract

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A method includes providing a substrate having a seal ring region and a circuit region, forming a seal ring structure over the seal ring region, forming a first frontside passivation layer above the seal ring structure, etching a frontside aperture in the first frontside passivation layer adjacent to an exterior portion of the seal ring structure, forming a frontside metal pad in the frontside aperture to couple the frontside metal pad to the exterior portion of the seal ring structure, forming a first backside passivation layer below the seal ring structure, etching a backside aperture in the first backside passivation layer adjacent to the exterior portion of the seal ring structure, and forming a backside metal pad in the backside aperture to couple the backside metal pad to the exterior portion of the seal ring structure. Semiconductor devices fabricated by such a method are also provided.

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Patent Owner(s)

  • TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.

International Classification(s)

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Lee, Hsin-Hui Kaohsiung, TW 68 770
Lin, Jeng-Shyan Tainan, TW 113 1138
Liu, Jen-Cheng Hsin-Chu, TW 393 3534
Tsai, Shu-Ting Kaohsiung, TW 63 494
Wang, Wen-De Minsyong Township, TW 87 1064
Yaung, Dun-Nian Taipei, TW 561 5991

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