Semiconductor device

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United States of America Patent

PATENT NO 9812583
APP PUB NO 20160293641A1
SERIAL NO

15187106

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A transistor includes a multilayer film in which an oxide semiconductor film and an oxide film are stacked, a gate electrode, and a gate insulating film. The multilayer film overlaps with the gate electrode with the gate insulating film interposed therebetween. The multilayer film has a shape having a first angle between a bottom surface of the oxide semiconductor film and a side surface of the oxide semiconductor film and a second angle between a bottom surface of the oxide film and a side surface of the oxide film. The first angle is acute and smaller than the second angle. Further, a semiconductor device including such a transistor is manufactured.

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Patent Owner(s)

  • SEMICONDUCTOR ENERGY LABORATORY CO., LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Takayuki Tochigi, JP 18 231
Jintyou, Masami Shimotsuga, JP 180 2218
Koshioka, Shunsuke Tochigi, JP 20 238
Nakazawa, Yasutaka Tochigi, JP 96 511
Sato, Takahiro Tochigi, JP 367 3766
Tokunaga, Hajime Yokohama, JP 64 1288

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