Substrate support with surface feature for reduced reflection and manufacturing techniques for producing same

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United States of America Patent

PATENT NO 9814099
SERIAL NO

14324557

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Abstract

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Methods and apparatus are provided for reducing the thermal signal noise in process chambers using a non-contact temperature sensing device to measure the temperature of a component in the process chamber. In some embodiments, a susceptor for supporting a substrate in a process chamber includes a first surface comprising a substrate support surface; and a second surface opposite the first surface, wherein a portion of the second surface comprises a feature to absorb incident radiant energy.

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Patent Owner(s)

  • APPLIED MATERIALS, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Brillhart, Paul Pleasanton, US 51 650
Lau, Shu-Kwan Mountain View, US 50 541
Ranish, Joseph M San Jose, US 183 4561
Samir, Mehmet Tugrul Mountain View, US 60 741

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