Block copolymer and associated photoresist composition and method of forming an electronic device

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United States of America Patent

PATENT NO 9815930
APP PUB NO 20170037178A1
SERIAL NO

14820647

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Abstract

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A block copolymer useful in electron beam and extreme ultraviolet photolithography includes a first block with units derived from a base-solubility-enhancing monomer and an out-of-band absorbing monomer, and a second block having a low surface energy. Repeat units derived from the out-of-ban absorbing monomer allow the copolymer to absorb significantly in the wavelength range 150 to 400 nanometers. When incorporated into a photoresist composition with a photoresist random polymer, the block copolymer self-segregates to form a top layer that effectively screens out-of-band radiation.

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Patent Owner(s)

Patent OwnerAddress
THE UNIVERSITY OF QUEENSLANDQUEENSLAND

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Blakey, Idriss Clayfield, AU 7 11
Du, Ke Queensland, AU 18 207
Thackeray, James W Braintree, US 96 1516
Trefonas,, III Peter Medway, US 96 377
Whittaker, Andrew Keith Toowong, AU 6 5

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