Electrode plate for plasma etching and plasma etching apparatus

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United States of America Patent

PATENT NO 9818583
SERIAL NO

14804576

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Abstract

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An electrode plate for a plasma etching is formed as a disc shape having a predetermined thickness, a plurality of gas holes penetrating a surface of the electrode plate perpendicularly to the surface are provided on different circumferences of a plurality of concentric circles, the electrode plate is divided in a radial direction of the electrode plate into two or more regions, types of gas holes provided in the two or more regions are different from each other by region.

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Patent Owner(s)

Patent OwnerAddress
TOKYO ELECTRON LIMITED3-1 AKASAKA 5-CHOME MINATO-KU TOKYO 1076325

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Nagakubo, Keiichi Nirasaki, JP 20 1178
Nagayama, Nobuyuki Nirasaki, JP 57 1261
Satoh, Naoyuki Nirasaki, JP 44 780

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