Internal split faraday shield for a plasma source

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United States of America Patent

PATENT NO 9818584
SERIAL NO

14325146

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Abstract

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An inductively coupled plasma source for a focused charged particle beam system includes a conductive shield within the plasma chamber in order to reduce capacitative coupling to the plasma. The internal conductive shield is maintained at substantially the same potential as the plasma source by a biasing electrode or by the plasma. The internal shield allows for a wider variety of cooling methods on the exterior of the plasma chamber.

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Patent Owner(s)

  • FEI COMPANY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Miller, Thomas G Portland, US 79 2628
Zhang, Shouyin Portland, US 21 149

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