Substrate processing apparatus, substrate processing method and storage medium storing substrate processing program
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United States of America Patent
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Nov 21, 2017
Grant Date -
Jun 11, 2015
app pub date -
Dec 4, 2014
filing date -
Dec 5, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate entire region treatment process of discharging a processing fluid of a temperature different from a surface temperature of a substrate 3 from a first nozzle 24 toward the substrate is performed while moving the first nozzle toward an outer side from an entire region treatment start position P2 located at a central portion to an entire region treatment end position P5 located at a peripheral portion. Then, after moving the first nozzle toward an inner side to a peripheral region treatment start position P6 located at an outer position than the entire region treatment start position P2, a substrate peripheral region treatment process of discharging the processing fluid from the first nozzle toward the substrate is performed while moving the first nozzle toward the outer side from the peripheral region treatment start position P6 to a peripheral region treatment stop position P7 located at a peripheral portion.
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