Polishing pad and preparing method thereof

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United States of America Patent

PATENT NO 9827646
APP PUB NO 20160339559A1
SERIAL NO

15158920

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Abstract

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The present disclosure relates to a porous polishing pad including pores by carbon dioxide gas generated by a reaction between a prepolymer and a hydrophilic polymer, and a method of preparing the porous polishing pad.

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Patent Owner(s)

Patent OwnerAddress
FNS TECH CO LTD246 SINGAL-RI JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNG-NAM

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Pal-Kon Cheonan-si, KR 4 11
Oh, Seung-Taek Cheonan-si, KR 10 66

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