Cleaner composition
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United States of America Patent
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Nov 28, 2017
Issued Date -
N/A
app pub date -
Jun 21, 2016
filing date -
Jun 23, 2015
priority date (Note) -
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Abstract
The present invention relates to a cleaner composition. Specifically, the present invention relates to a cleaner composition that can be used to remove metal oxides and metal abrasive particles arising during metal polishing, such as chemical mechanical planarization (CMP). The cleaner composition has an improved ability to complex with metal abrasive particles. In addition, the cleaner composition maintains its ability to reduce metal abrasive particles, achieving improved stability. Therefore, the cleaner composition can be used for cleaning the surface of a metal with an increased ability to prevent corrosion of the metal surface.
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