Metrology sampling method and computer program product thereof
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United States of America Patent
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Nov 28, 2017
Grant Date -
Oct 1, 2015
app pub date -
Mar 24, 2015
filing date -
Mar 26, 2014
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Abstract
In a metrology sampling method, various index values that can detect various status changes of a process tool (such as maintenance operation, parts changing, parameter adjustment, etc.), and/or information abnormalities of the process tool (such as abnormal process data, parameter drift/shift, abnormal metrology data, etc.) appear in a manufacturing process are applied to develop an intelligent sampling decision (ISD) scheme for reducing sampling rate while VM accuracy is still sustained. The indices includes a reliance Index (RI), a global similarity index (GSI), a process data quality index (DQIX) and a metrology data quality index (DQIy).
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