Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device

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United States of America Patent

PATENT NO 9829796
SERIAL NO

15011863

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Abstract

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There are provided A pattern formation method, including:

    (1) forming a film using an active light-sensitive or radiation-sensitive resin composition;(2) exposing the film to active light or radiation; and(3) developing the exposed film using a developer including an organic solvent,wherein the active light-sensitive or radiation-sensitive resin composition contains a resin (A) having specific 3 repeating units.

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Patent Owner(s)

  • FUJIFILM CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Takizawa, Hiroo Shizuoka, JP 119 917
Tsuchimura, Tomotaka Shizuoka, JP 102 600
Tsuruta, Takuya Shizuoka, JP 24 75

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