Process flow for manufacturing semiconductor on insulator structures in parallel

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United States of America Patent

PATENT NO 9831115
SERIAL NO

15435428

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Abstract

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A cost effective process flow for manufacturing semiconductor on insulator structures is parallel is provided. Each of the multiple semiconductor-on-insulator composite structures prepared in parallel comprises a charge trapping layer (CTL).

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GLOBALWAFERS CO LTDNO 8 INDUSTRIAL EAST ROAD 2 SCIENCE-BASED INDUSTRIAL PARK HSINCHU

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jones, Andrew M Wildwood, US 31 392
Kommu, Srikanth St. Charles, US 19 411
Libbert, Jeffrey L O'Fallon, US 62 623
Peidous, Igor Eaton, US 58 632

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