Method for manufacturing MEMS torsional electrostatic actuator

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United States of America Patent

PATENT NO 9834437
SERIAL NO

15327230

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Abstract

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A method for manufacturing an MEMS torsional electrostatic actuator comprises: providing a substrate, wherein the substrate comprises a first silicon layer, a buried oxide layer and a second silicon layer that are laminated sequentially; patterning the first silicon layer and exposing the buried oxide layer to form a rectangular upper electrode plate separated from a peripheral region, wherein the upper electrode plate and the peripheral region are connected by only using a cantilever beam, and forming, on the peripheral region, a recessed portion exposing the buried oxide layer; patterning the second silicon layer and exposing the buried oxide layer to form a back cavity, wherein the back cavity is located in a region of the second silicon layer corresponding to the upper electrode plate, covers 40% to 60% of the area of the region corresponding to the upper electrode plate, and is close to one end of the cantilever beam; exposing the second silicon layer, and suspending the upper electrode plate and the cantilever beam; and respectively forming an upper contact electrode and a lower contact electrode on the second silicon layer.

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Patent Owner(s)

  • CSMC TECHNOLOGIES FAB1 CO., LTD.;CSMC TECHNOLOGIES FABI CO., LTD.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Jing, Errong Jiangsu, CN 5 4

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