Plasma chamber having an upper electrode having controllable valves and a method of using the same
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United States of America Patent
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Dec 12, 2017
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app pub date -
Jun 1, 2012
filing date -
Jun 1, 2012
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Abstract
This description relates to a plasma treatment apparatus including a vapor chamber, a gas supply and an upper electrode assembly. The upper electrode assembly includes a gas distribution plate having a plurality of holes in a bottom surface thereof and an upper electrode having at least one gas nozzle and at least one controllable valve connected to the at least one gas nozzle. The plasma treatment apparatus further includes a controller configured to generate a control signal. The at least one controllable valve is configured to be adjusted based on the control signal. A control system and a method of controlling a controllable valve are also described.
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