Method and system for imaging of a photomask through a pellicle

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United States of America Patent

PATENT NO 9842724
SERIAL NO

15012599

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Abstract

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A system for imaging a sample through a protective pellicle is disclosed. The system includes an electron beam source configured to generate an electron beam and a sample stage configured to secure a sample and a pellicle, wherein the pellicle is disposed above the sample. The system also includes an electron-optical column including a set of electron-optical elements to direct at least a portion of the electron beam through the pellicle and onto a portion of the sample. In addition, the system includes a detector assembly positioned above the pellicle and configured to detect electrons emanating from the surface of the sample.

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Patent Owner(s)

  • KLA-TENCOR CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Delgado, Gildardo Livermore, US 34 190
Rose, Garry A Livermore, US 3 5
Schultz, William G San Jose, US 8 94

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