Method and apparatus for the detection of arc events during the plasma processing of a wafer, surface of substrate
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United States of America Patent
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Dec 12, 2017
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Aug 12, 2010
filing date -
Aug 17, 2009
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Abstract
A method for monitoring at least one process parameter of a plasma process being performed on a semiconductor wafer, surface or surface and determine arc events occurring within the plasma tool chamber. The method comprises the steps of detecting the modulated light being generated from the plasma sheath during the plasma process; sampling RF voltage and current signals from the RF transmission line; processing the detected modulated light and the RF signals to produce at least one monitor statistic for the plasma process, and process the monitor signal to determine the occurrence of arcing events during the wafer processing.
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