Substrate liquid processing apparatus
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United States of America Patent
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Dec 12, 2017
Issued Date -
N/A
app pub date -
Oct 26, 2015
filing date -
Oct 28, 2014
priority date (Note) -
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status (Latency Note)
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Abstract
Disclosed is a substrate liquid processing apparatus. The apparatus includes: a substrate holding unit configured to hold a substrate horizontally; a nozzle configured to eject a processing liquid in a transversal direction toward a liquid arrival target position set on the substrate held by the substrate holding unit from an ejection port which is located at an injection position spaced away from the liquid arrival target position by a predetermined distance horizontally; and a liquid receiving unit provided below the nozzle to receive the processing liquid dropping from the ejection port of the nozzle.
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