Method of manufacturing transparent conductor, transparent conductor and device for manufacturing the same, and device for manufacturing transparent conductor precursor

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United States of America Patent

PATENT NO 9847150
SERIAL NO

14657571

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Abstract

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According to one embodiment, a method of manufacturing a transparent conductor is provided. In the method, a silver nanowire layer including a plurality of silver nanowires and having openings is formed on a graphene film supported by a copper support. Then, a transparent resin layer insoluble in a copper-etching solution is formed on the silver nanowire layer such that the transparent resin layer contacts the graphene film through the openings. The copper support is then brought into contact with the non-acidic copper-etching solution to remove the copper support, thereby exposing the graphene film.

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Patent Owner(s)

  • KABUSHIKI KAISHA TOSHIBA

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Akasaka, Yoshihiro Kanagawa, JP 60 1611
Naito, Katsuyuki Tokyo, JP 124 1458
Yang, Tianyi Kanagawa, JP 14 18
Yoshinaga, Norihiro Kanagawa, JP 58 200

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