Imprint apparatus
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United States of America Patent
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Dec 26, 2017
Issued Date -
N/A
app pub date -
Jan 25, 2013
filing date -
Jan 27, 2012
priority date (Note) -
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status (Latency Note)
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Abstract
An imprint apparatus forms a pattern of a resin on a region to be processed of a substrate using a mold including a pattern region on which a pattern is formed and includes a correction unit configured to correct a shape of a target region that is either the pattern region on the mold or the region to be processed on the substrate, wherein the correction unit further includes: a heating unit configured to heat an object corresponding to the target region of either the mold or the substrate in a heating region having an area smaller than that of the pattern region on the mold; a scanning unit configured to scan the heating region with respect to the target region by changing the relative position of the target region and the heating region; and a control unit configured to acquire information regarding a correction deformation amount of the target region and control the heating unit and the scanning unit based on the information.
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