Registration mark formation during sidewall image transfer process

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United States of America Patent

PATENT NO 9859224
SERIAL NO

15239166

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Abstract

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Methods of forming a registration mark such as an alignment mark or overlay mark during formation of sub-lithographic structures are provided. Methods may include forming a plurality of mandrels over a hard mask over a semiconductor layer, each mandrel including a spacer adjacent thereto. At least one mandrel is selected of the plurality of mandrels and a mask is formed over the at least one selected mandrel. The plurality of mandrels are removed leaving the spacers, the mask preventing removal of the at least one selected mandrel. The mask is removed. A first etching patterns the sub-lithographic structures and the registration mark into the hard mask using the spacers as a pattern of the sub-lithographic structure and the at least one selected mandrel and adjacent spacer for the registration mark. A second etching forms the sub-lithographic structures in the semiconductor layer using the patterned hard mask and to form the registration mark in the semiconductor layer using the at least one selected mandrel and the patterned hard mask.

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Patent Owner(s)

  • INTERNATIONAL BUSINESS MACHINES CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Conklin, David J Sleepy Hollow, US 4 30
Gabor, Allen H Katonah, US 43 367
Kanakasabapathy, Sivananda K Niskayuna, US 193 2174
Kim, Byeong Y Lagrangeville, US 53 1073
Lie, Fee Li Albany, US 177 998
Sieg, Stuart A Albany, US 62 219

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