Method for reacting flowing liquid and gas in a plasma discharge reactor

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United States of America Patent

PATENT NO 9861950
SERIAL NO

14213068

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Abstract

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The activation of the C—H bond using low temperature plasma with an inlet liquid stream such that value added products are formed effectively. An organic liquid (e.g., hexane which is immiscible with liquid water) is injected into a flowing gas (argon) stream followed by mixing with a liquid water stream. Thereafter, the mixture contacts a plasma region formed by a pulsed electric discharge. The plasma formed with the flowing liquid and gas between the two electrodes causes chemical reactions that generate various compounds.

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Patent Owner(s)

Patent OwnerAddress
FLORIDA STATE UNIVERSITY RESEARCH FOUNDATION INC2000 LEVY AVENUE BUILDING A SUITE 351 TALLAHASSEE FL 32310

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Alabugin, Igor Tallahassee, US 12 37
Bresch, Stefan Tallahassee, US 7 91
Hsieh, Kevin Tallahassee, US 15 214
Locke, Bruce R Tallahassee, US 13 53
Wandell, Robert Tallahassee, US 5 19

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