Nanoscale structure with epitaxial film having a recessed bottom portion

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United States of America Patent

PATENT NO 9865684
SERIAL NO

14707292

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Abstract

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An embodiment of the invention includes an epitaxial layer that directly contacts, for example, a nanowire, fin, or pillar in a manner that allows the layer to relax with two or three degrees of freedom. The epitaxial layer may be included in a channel region of a transistor. The nanowire, fin, or pillar may be removed to provide greater access to the epitaxial layer. Doing so may allow for a “all-around gate” structure where the gate surrounds the top, bottom, and sidewalls of the epitaxial layer. Other embodiments are described herein.

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Patent Owner(s)

  • INTEL CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chau, Robert Portland, US 86 3289
Chu-Kung, Benjamin Hillsboro, US 216 2231
Dasgupta, Sansaptak Hillsboro, US 243 1320
Dewey, Gilbert Hillsboro, US 438 4085
Goel, Niti Austin, US 38 511
Kavalieros, Jack Portland, US 270 9057
Le, Van Beaverton, US 39 462
Metz, Matthew Portland, US 78 810
Mukherjee, Niloy Beaverton, US 230 3762
Pillarisetty, Ravi Portland, US 449 7335
Rachmady, Willy Beaverton, US 424 5601
Radosavljevic, Marko Beaverton, US 465 4701
Then, Han Wui Portland, US 300 1968
Zelick, Nancy Portland, US 18 307

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