Graphene formation
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United States of America Patent
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Jan 30, 2018
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app pub date -
Jun 15, 2011
filing date -
Jun 15, 2011
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Abstract
Technologies are generally described for forming graphene and structures including graphene. In an example, a system effective to form graphene may include a chamber adapted to receive graphite oxide. The system may also include a source of an inert gas and a source of hydrogen, which may both be configured in communication with the chamber. A processor may be configured in communication with the chamber, the inert gas source and/or the hydrogen source. The processor may be further configured to control the flow of the inert gas from the first source through the chamber under first sufficient reaction conditions to remove at least some oxygen from the atmosphere of the chamber. The processor may also be configured to control the flow of the hydrogen from the second source to the graphite oxide in the chamber under second sufficient reaction conditions to form graphene from the graphite oxide.
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