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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

• FUJIMI INCORPORATED

International Classification(s)

• C09K:MATERIALS FOR APPLICATIONS NOT OTHERWISE PROVIDED ....
• B24B:MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR PO....
• H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
• C03C:CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREO....
• C09G:POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH; S....
• C23F:NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM S....
• C30B:SINGLE-CRYSTAL GROWTH
• B44C:PRODUCING DECORATIVE EFFECTS
• C25F:PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIAL....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hotta, Kazutoshi	Kiyosu, JP	6	31
Ito, Jun	Kiyosu, JP	263	3594
Morinaga, Hitoshi	Kiyosu, JP	64	502
Sugiyama, Hiroyasu	Kiyosu, JP	15	127

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Jul 30, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Jul 30, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
January 30, 2018	US,9879156,B2   US9879156B2	GRANTED PATENT AS SECOND PUBLICATION
January 07, 2016	US,20160002500,A1   US20160002500A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 9879156

Polishing composition

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