Compositions and processes for fabrication of rear passivated solar cells

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United States of America Patent

PATENT NO 9882082
SERIAL NO

14442024

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Abstract

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Compositions used in, and methods for, fabricating a rear-passivated silicon solar cell are described. A novel method of opening the back surface for contacting the silicon with a conventional aluminum paste is described. Various novel screen printable etch resists are described. First, such an etch resist can be printed on the rear of a rear-passivated solar cell wafer. The passivation layer can then be removed using a wet etch, and next the etch resist layer can be removed. Further, an additional wet etch step may optionally be used to deepen the opening into the silicon and enhance the BSF (back-surface field). Aluminum paste can then be printed over the entire backside of the now etched cell. The entire cell is then fired. In exemplary embodiments of the present invention, the paste can be chosen so that it will not fire through the passivation layer.

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Patent Owner(s)

  • SUN CHEMICAL CORPORATION

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Garcia, Joel North Bergen, US 10 39
He, Jin-An Mountain Lakes, US 17 108
Kreutz, Ted Roseland, US 3 2
Liu, Monica Aurora, US 2 10
Mostowy-Gallagher, Maura Succasunna, US 8 21
Robins, Graham Lafox, US 1 0

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