Polishing pad and method for making the same

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United States of America Patent

PATENT NO 9884400
SERIAL NO

14872370

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Abstract

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The present invention relates to a polishing pad and a method for making the same. The polishing pad includes a polymeric elastomer and a plurality of hollow structures. The hollow structures are distributed in the polymeric elastomer uniformly, and the sizes of the hollow structures are substantially equal to each other.

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Patent Owner(s)

Patent OwnerAddress
SAN FANG CHEMICAL INDUSTRY CO LTDKAOHSIUNG CITY

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Feng, Chung-Chih Kaohsiung, TW 112 308
Song, Hsin-Ru Kaohsiung, TW 6 0
Wu, Wen-Chieh Kaohsiung, TW 53 137
Yao, I-Peng Kaohsiung, TW 79 189

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