Plasma treatment apparatus and plasma treatment method

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United States of America Patent

PATENT NO 9885115
SERIAL NO

13688633

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Abstract

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A plasma treatment apparatus that includes a chamber having an opening portion which serves as a plasma ejection port surrounded by a dielectric member; a gas supply pipe that introduces gas into an inside of the chamber; a solenoid coil disposed in a vicinity of the chamber; a high-frequency power supply having a pulse modulation function which is connected to the solenoid coil; and a base material mounting table disposed on a plasma ejection port side. Plasma can be stably generated using the plasma treatment apparatus.

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Patent Owner(s)

Patent OwnerAddress
PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO LTD22-6 MOTO-MACHI KADOMA-SHI OSAKA 571-0057

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Okumura, Tomohiro Osaka, JP 151 1895

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