Microwave plasma reactors

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United States of America Patent

PATENT NO 9890457
SERIAL NO

14117213

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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Microwave plasma assisted reactors, for example chemical vapor deposition (MPCVD) reactors, are disclosed. The disclosed reactors operate at high pressures (>180-320 Torr) and high power densities (>150 W/cm3), and thereby enable high deposition rate CVD processes that rapidly deposit materials. In particular, reactor design examples are described that, when operating in the 180-320 Torr pressure regime, rapidly CVD synthesize high quality polycrystalline (PCD) and single crystal diamond (SCD). The improved reactors include a radial contraction in the vicinity of the plasma chamber (and optionally a combined expansion in the vicinity of the electromagnetic wave source, followed by the contraction) in the main microwave chamber as electromagnetic energy propagates from an electromagnetic wave source to a plasma/deposition chamber.

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Patent Owner(s)

  • BOARD OF TRUSTEES OF MICHIGAN STATE UNIVERSITY

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Asmussen, Jes East Lansing, US 38 1360
Grotjohn, Timothy A Okemos, US 13 223
Gu, Yajun Okemos, US 6 71

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