Method for producing mold for nanoimprinting and anti-reflective article

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United States of America Patent

PATENT NO 9890466
SERIAL NO

14911413

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Abstract

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This method for producing a mold for nanoimprinting in which a minute bumpy structure has been formed at the surface of a roller-shaped aluminum substrate of which the surface has been machined has: a polishing step for mechanically polishing the surface of the roller-shaped aluminum substrate, of which the surface has been machined, at least until the average crystal grain size changes; and a minute bumpy structure formation step for anodizing the aluminum substrate after the polishing step and forming a minute bumpy structure. The anti-reflective article has a minute bumpy structure at the surface, and in the wavelength region of visible light, has a color difference (E*) to the origin represented in the L*a*b* color system and derived by means of formula (1) of no greater than 0.9, or a chroma (C*) determined by means of formula (2) of no greater than 0.7.

description='In-line Formulae' end='lead'E*={(L*)2+(a*)2+(b*)2}1/2  (1)description='In-line Formulae' end='tail'

description='In-line Formulae' end='lead'C*={(a*)2+(b*)2}1/2  (2)description='In-line Formulae' end='tail'

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Patent Owner(s)

Patent OwnerAddress
MITSUBISHI CHEMICAL CORPORATIONTOKYO 100-8251

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hara, Katsumi Yokohama, JP 5 3
Onomoto, Hiroshi Otake, JP 10 20
Ookawa, Makoto Yokohama, JP 7 67
Shakagoori, Shinya Yokohama, JP 2 3
Takanashi, Kazuya Yokohama, JP 9 19

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